Seoul, South Korea

Doo-Hyun Bae

This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Doo-Hyun Bae. Retrieved from https://idiyas.com/inventor/doo-hyun-bae

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Doo-Hyun Bae in Encryption Technology

Introduction

Doo-Hyun Bae is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of encryption technology, particularly through his innovative patent that utilizes the RC4 algorithm. His work aims to enhance data security while minimizing processing delays.

Latest Patents

Doo-Hyun Bae holds a patent for a "Cipher device using RC4 algorithm and method thereof." This invention focuses on an encryption/decryption device that employs the RC4 algorithm to reduce waiting times for encryption and decryption processes. The device is designed to avoid data processing delays, making it a valuable asset in the realm of secure communications.

Career Highlights

Bae is affiliated with the Electronics and Telecommunications Research Institute, where he has been instrumental in advancing encryption technologies. His work has not only contributed to the efficiency of data security but also to the overall improvement of communication systems.

Collaborations

Some of his notable coworkers include Yun-Joo Kim and Sok-Kyu Lee, who have collaborated with him on various projects within the institute.

Conclusion

Doo-Hyun Bae's contributions to encryption technology through his innovative patent demonstrate his commitment to enhancing data security. His work continues to influence the field and showcases the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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