Company Filing History:
Years Active: 2016-2019
Title: Doni Parnell: Innovator in Semiconductor Technology
Introduction
Doni Parnell is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor technology, particularly in the production of fin structures. With a total of 2 patents, his work is recognized for its innovative approaches and practical applications.
Latest Patents
Doni Parnell's latest patents focus on a method for producing fin structures of a semiconductor device in a substrate. This method utilizes Directed Self Assembly (DSA) lithographic patterning. The process involves providing a semiconductor substrate covered with a shallow trench isolation (STI) layer stack. It also includes defining a fin area on the substrate through a lithographic patterning step, where the fin structures will be produced. The fin structures are then created within the fin area according to a predetermined fin pattern using DSA lithographic patterning. This disclosure also relates to associated semiconductor structures.
Career Highlights
Doni Parnell is currently employed at Imec Vzw, a leading research and innovation hub in nanoelectronics and digital technologies. His work at Imec has allowed him to push the boundaries of semiconductor research and development.
Collaborations
Doni collaborates with talented individuals such as Boon Teik Chan and Safak Sayan. These collaborations enhance the innovative environment at Imec and contribute to the advancement of semiconductor technologies.
Conclusion
Doni Parnell's contributions to semiconductor technology through his patents and work at Imec Vzw highlight his role as an influential inventor in the field. His innovative methods for producing fin structures are paving the way for advancements in semiconductor devices.