Doni Parnell

Title: Doni Parnell: Innovator in Dielectric Etching Technologies

Introduction

Doni Parnell is an accomplished inventor based in Albany, NY, known for his significant contributions to the field of semiconductor manufacturing. With two patents to his name, Parnell's innovations focus on improving processes essential for the efficient etching of dielectric materials, paving the way for advancements in electronic devices.

Latest Patents

Among his most notable patents is the "Method of selective deposition for BEOL dielectric etch." This invention addresses critical issues related to dielectric material etching for Back End Of Line (BEOL) applications. The method involves providing a patterned substrate with dielectric material and applying gas phase plasma to functionalize the surface. Following this, a silanizing reagent is used to react with the functionalized surface, forming a dielectric film. This process can be repeated to enhance the film's thickness. Notably, the dielectric material can be a porous low-k material, which is crucial in sealing the pores on its surface.

Another significant patent by Parnell is the "Method and system for performing post-etch annealing of a workpiece." This method outlines an innovative approach for post-etch annealing of workpieces, particularly in an annealing system. It includes the disposal of workpieces with multilayer stacks of thin films, which are patterned using an etching process to create electronic devices. The annealing process is tailored to adjust properties of the patterned magnetic material layer, ensuring optimal functionality of the resultant devices.

Career Highlights

Doni Parnell is currently associated with Tokyo Electron Limited, a company known for its advanced semiconductor manufacturing equipment. His work focuses on enhancing production quality and efficiency through innovative etching technologies. Parnell's contributions have been pivotal in maintaining the company's competitive edge in the semiconductor industry.

Collaborations

Throughout his career, Parnell has had the opportunity to collaborate with esteemed professionals in his field, including Yannick Feurprier and David Hurley. These collaborations have fostered a creative exchange of ideas, further enhancing the development of his inventive processes.

Conclusion

In conclusion, Doni Parnell stands out as a prominent inventor whose innovations in dielectric etching are making impactful strides in the semiconductor manufacturing industry. With his expertise and collaborative spirit, he continues to contribute valuable advancements that resonate within the electronic devices market, showcasing the importance of innovation in technology.