Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Dongyu Fan
Introduction
Dongyu Fan is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method for fabricating semiconductor devices.
Latest Patents
Dongyu Fan holds a patent for a "Method of fabricating a semiconductor device using laser annealing." This patent describes a process that involves forming a channel hole in a stack of alternating layers over a substrate. The method includes the sequential formation of a gate dielectric layer and a channel layer within the channel hole. Notably, laser annealing is performed on the channel layer using laser light, which is designed to create total internal reflection at specific interfaces, enhancing the performance of the semiconductor device. He has 1 patent to his name.
Career Highlights
Dongyu Fan is currently employed at Yangtze Memory Technologies Co., Ltd. His role at the company allows him to apply his expertise in semiconductor manufacturing and contribute to advancements in the industry. His work is crucial in the ongoing development of memory technologies.
Collaborations
Dongyu Fan collaborates with talented individuals in his field, including coworkers Yuancheng Yang and Kun Zhang. Their combined efforts contribute to innovative solutions in semiconductor technology.
Conclusion
Dongyu Fan's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing.