Company Filing History:
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1 out of 381 Years Active: 2021
Title: The Innovations of Dongwun Shin
Introduction
Dongwun Shin is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of silicon layer etching, which is crucial in semiconductor manufacturing. His innovative work has led to the development of a unique etchant composition that enhances the efficiency of pattern formation.
Latest Patents
Dongwun Shin holds a patent for a silicon layer etchant composition and method of forming a pattern using the same. This composition includes about 1 wt % to about 20 wt % of an alkylammonium hydroxide, about 1 wt % to about 30 wt % of an amine compound, about 0.01 wt % to about 0.2 wt % of a nonionic surfactant that contains both a hydrophobic group and a hydrophilic group, along with water. This innovative formulation is designed to improve the etching process in semiconductor applications.
Career Highlights
Throughout his career, Dongwun Shin has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and Dongwoo Fine-chem Co., Ltd., where he has contributed to various projects and advancements in semiconductor technology.
Collaborations
Some of his notable coworkers include Changsu Jeon and Jungmin Oh. Their collaborative efforts have furthered research and development in the field of silicon etching.
Conclusion
Dongwun Shin's contributions to the field of silicon layer etching demonstrate his innovative spirit and commitment to advancing technology. His patent and work with leading companies highlight his importance as an inventor in the semiconductor industry.