Changwon, South Korea

Dongwoo Seok

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Em-Tech, Inc., Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongwoo Seok. Retrieved from https://idiyas.com/inventor/dongwoo-seok

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Dongwoo Seok

Introduction

Dongwoo Seok is a notable inventor based in Changwon, South Korea. He has made significant contributions to the field of wearable technology. His innovative designs focus on enhancing user experience through practical and efficient solutions.

Latest Patents

Dongwoo Seok holds a patent for a wearable device that includes a speaker frame with a vent hole. This device features a housing that forms an inner space and includes a speaker hole. Inside the housing, there is a speaker assembly and a sound duct that extends from the inner surface to the speaker assembly. The speaker assembly consists of a frame with multiple openings and a flow path that connects them. This design aims to improve sound quality and user comfort.

Career Highlights

Throughout his career, Dongwoo Seok has worked with prominent companies such as Samsung Electronics Ltd. and Em-Tech, Inc. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Dongwoo has collaborated with talented individuals like Jungsoo Lee and Jihoon Song. Their teamwork has led to advancements in wearable technology and has fostered a creative environment for innovation.

Conclusion

Dongwoo Seok's contributions to the field of wearable devices exemplify his innovative spirit and dedication to enhancing technology. His work continues to inspire future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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