Changwon, South Korea

Dongseuk Park

This inventor holds 1 USPTO granted patent. Top assignee: Hanwha Techwin Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongseuk Park. Retrieved from https://idiyas.com/inventor/dongseuk-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

Loading Chart...
1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: Dongseuk Park**

Introduction

Dongseuk Park is a prominent inventor based in Changwon-si, South Korea. With a focus on innovation in imaging technology, Dongseuk has made significant contributions through his unique patent that enhances the capabilities of auto-focusing systems.

Latest Patents

Dongseuk Park holds one patent entitled "Auto-focusing system and method." This innovative method divides an image into multiple blocks and utilizes discrete cosine transform (DCT) techniques to enhance focus accuracy. By generating a DCT mask tailored for specific frequency ranges within DCT blocks, the system calculates a focus value, optimizing image clarity and quality.

Career Highlights

Dongseuk is affiliated with Hanwha Techwin Co., Ltd., a leading company in advanced imaging solutions. His inventive work not only reflects his genius but also contributes to the advancement of technologies in the field of optics and imaging.

Collaborations

Dongseuk has collaborated with talented coworkers such as Kyungeun Lee and Youngseo Park. Together, they have contributed to fostering innovation and creativity within their organization, driving forward-thinking solutions in imaging technology.

Conclusion

In conclusion, Dongseuk Park's dedication to innovation in auto-focusing systems showcases the impactful role inventors play in enhancing technology. His patent will likely influence future developments in imaging techniques, reinforcing the importance of ongoing research and collaboration in this dynamic field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…