This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2018
Title: Innovations by Dongqing Li: A Pioneer in Substrate Technology
Introduction
Dongqing Li is a notable inventor based in Beijing, China. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on improving substrate handling and transportation methods, which are crucial for the manufacturing of display devices.
Latest Patents
Dongqing Li's latest patents include a substrate carrying apparatus and a sputtering device comprising the same. The substrate carrying apparatus features a vertical bearing plate and an upper holding base designed to securely hold substrates during the loading process. This innovative design minimizes the risk of substrate damage by ensuring that the substrate is held in place without falling. Additionally, he has developed an apparatus for carrying substrates using off-line vacuum suction, which enhances the efficiency of substrate transportation.
Career Highlights
Throughout his career, Dongqing Li has worked with prominent companies in the display technology sector, including BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in substrate technology.
Collaborations
Dongqing Li has collaborated with several professionals in his field, including Xu Shi and Jun Feng Liu. These partnerships have facilitated the exchange of ideas and fostered innovation in substrate handling techniques.
Conclusion
Dongqing Li's contributions to substrate technology have positioned him as a key figure in the display industry. His innovative patents and collaborative efforts continue to influence advancements in this critical area of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile