This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dongok Shin and Plasma Phase-Shift Wafer Processing
Introduction
Dongok Shin is an inventor based in Suwon, South Korea, associated with ASM IP Holding B.V. His listed work includes 2 patents concerning plasma-based substrate and wafer processing systems.
Latest Patents
“Substrate Processing Apparatus Using Plasma Phase Shift” describes a system with multiple reaction chambers on a platform and a plasma generator that supplies plasma or plasma power to the chambers. A control circuit can independently shift the phase supplied to each chamber, enabling phase adjustment across the processing system.
“Wafer Processing Apparatus Using Plasma Phase Shift” presents a related system for processing wafers in multiple reaction chambers. Its plasma generator supplies plasma at a specified frequency and phase, while a control circuit independently shifts the phase provided to each chamber.
Career Highlights
Shin’s listed inventions focus on controlling plasma phase in multi-chamber processing equipment. The described systems use independent phase adjustment to support plasma-based processing of substrates and wafers.
Collaborations
Jeongsu Lee and Songwhe Herr are listed as Shin’s coworkers.
Conclusion
Dongok Shin’s listed patent work centers on plasma phase control for multi-chamber substrate and wafer processing, with independent adjustment as a key feature of both inventions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile