This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018-2026
Title: Dongmin Han: Image Sensor Inventions
Introduction
Dongmin Han is an inventor based in Daegu, South Korea, whose work includes image sensor technologies. He is associated with Samsung Electronics Co., Ltd. and is credited with 3 patents.
Latest Patents
Han’s recent patent work includes inventions addressing image-sensor structures and fabrication.
“Image Sensor and Method of Fabricating the Same” describes a sensor with a semiconductor substrate, pixel isolation structure, and photoelectric conversion region. Its design also includes a floating diffusion region, a transfer gate electrode, and a second device isolation layer positioned between the transfer gate and floating diffusion region.
“Dual Vertical Gate and Image Sensor Including the Same” describes a dual vertical gate with two spaced vertical extensions connected by a connecting portion. The patent also specifies an element isolation layer beside a vertical extension and a separation area between the extensions.
Career Highlights
Han’s listed inventions focus on image-sensor components, including pixel isolation, transfer gates, and vertical gate structures. These technologies relate to the design and fabrication of semiconductor image sensors.
Collaborations
Han’s listed coworkers include Heegeun Jeong and Seungjoo Nah. His work is associated with Samsung Electronics Co., Ltd.
Conclusion
Dongmin Han’s patent portfolio reflects contributions to image-sensor design, particularly pixel structures and dual vertical gates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile