Daejeon, South Korea

Dongjoo Kwon

This inventor holds 1 USPTO granted patent. Top assignee: Lg Hausys, Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dongjoo Kwon. Retrieved from https://idiyas.com/inventor/dongjoo-kwon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dongjoo Kwon

Introduction

Dongjoo Kwon is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of novel organic-inorganic silica particles. His work has implications for various applications, including hard coating compositions.

Latest Patents

Dongjoo Kwon holds a patent for "Organic-inorganic silica particles, method of preparing the same, and hard coating composition containing the same." This invention relates to innovative organic-inorganic silica particles that feature an initiator chemically bonded to hydroxyl groups on the surface. The preparation method and the resulting hard coating composition are designed to produce a hard coating film with excellent abrasion and scratch resistance.

Career Highlights

Kwon is currently associated with LG Hausys, Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the performance of materials used in various industries.

Collaborations

He has collaborated with notable colleagues, including Yanggu Kang and Won-Kook Kim, to further his research initiatives and innovations.

Conclusion

Dongjoo Kwon's contributions to the field of materials science through his innovative patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in hard coating technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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