Donghyuk Yeom

Title: Donghyuk Yeom: Innovator in Semiconductor Technology

Introduction

Donghyuk Yeom is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing semiconductor devices and their fabrication methods.

Latest Patents

Donghyuk Yeom's latest patents include innovative designs for semiconductor devices. One of his patents describes a semiconductor device that features first and second active regions on a substrate, along with first and second insulating structures. These structures are vertically stacked with channel layers and gate structures that intersect the active regions. The design also includes source/drain regions doped with different conductivity-type impurities, enhancing the device's performance.

Another patent outlines a semiconductor device and a method of fabricating it. This invention includes an active pattern on a substrate, a device isolation layer, and a pair of source/drain patterns. The channel pattern consists of stacked semiconductor patterns, with a gate electrode crossing the channel. The gate spacer design is particularly noteworthy, as it features varying thicknesses to optimize the device's functionality.

Career Highlights

Donghyuk Yeom is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His role involves research and development in semiconductor technologies, where he applies his expertise to create cutting-edge solutions.

Collaborations

Throughout his career, Donghyuk Yeom has collaborated with notable colleagues, including Seonghwa Park and Kwan Heum Lee. These partnerships have contributed to the advancement of their collective work in semiconductor innovations.

Conclusion

Donghyuk Yeom is a key figure in the semiconductor industry, with a focus on innovative device designs and fabrication methods. His contributions continue to shape the future of technology in this critical field.