Yongin, South Korea

Donghwi Shin

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghwi Shin. Retrieved from https://idiyas.com/inventor/donghwi-shin-dce34d5w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Donghwi Shin in Semiconductor Technology

Introduction

Donghwi Shin is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his expertise and innovative spirit. His work primarily focuses on methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

Donghwi Shin's latest patents include a method of fabricating a semiconductor device that incorporates a porous dielectric layer. This method involves sequentially stacking an interlayer insulating layer, a porous dielectric layer, a first mask layer, and a second mask layer on a substrate. The process includes etching the second mask layer to form preliminary mask patterns, followed by further etching to create grooves in the porous dielectric layer. The porous dielectric layer is composed of SiOCH, while the first mask layer consists of carbon-free silicon oxide (SiO).

Another notable patent is a method of forming wiring and manufacturing a semiconductor device using the same. This method begins with the formation of an insulating interlayer that includes a low-k dielectric material on a substrate. It involves multiple etching processes to create openings through the insulating interlayer, followed by the formation of wiring in these openings.

Career Highlights

Donghwi Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge advancements in semiconductor technology, enhancing the performance and efficiency of electronic devices.

Collaborations

Throughout his career, Donghwi Shin has collaborated with talented individuals such as Hyunchul Lee and Jongcheon Kim. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Donghwi Shin's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His methods for fabricating semiconductor devices are paving the way for advancements in electronics, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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