Sejong, South Korea

Donghwi Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Dongwoo Fine-Chem Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghwi Kim. Retrieved from https://idiyas.com/inventor/donghwi-kim-m0wti4mp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Donghwi Kim: Innovator in Hard Coating Technology

Introduction

Donghwi Kim is a notable inventor based in Sejong, South Korea. He has made significant contributions to the field of hard coating technology, particularly through his innovative patent. His work focuses on enhancing the durability and performance of coating materials used in various applications.

Latest Patents

Donghwi Kim holds a patent for a hard coating composition and hard coating film. The patent describes a hard coating composition that includes an alkoxysilane compound or polysiloxane resin with an epoxy group, an acrylate compound with an isocyanate group, a photopolymerization initiator, and a solvent. This invention aims to create a hard coating film that minimizes curling while maintaining excellent hardness. The patent showcases his expertise in developing advanced materials for image display devices.

Career Highlights

Donghwi Kim is associated with Dongwoo Fine-Chem Co., Ltd., where he applies his knowledge and skills in material science. His work at the company has contributed to advancements in coating technologies, making significant impacts in the industry.

Collaborations

He has collaborated with colleagues such as Seungwoo Lee and Seunghee Kim, working together to push the boundaries of innovation in their field.

Conclusion

Donghwi Kim's contributions to hard coating technology exemplify his dedication to innovation and excellence. His patent reflects a commitment to improving material performance, which is crucial for various applications in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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