Osaka, Japan

Donghui Ma

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Kanadevia Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghui Ma. Retrieved from https://idiyas.com/inventor/donghui-ma-k7cksz3s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Donghui Ma in Residual Stress Improvement

Introduction

Donghui Ma is an accomplished inventor based in Osaka, Japan. She has made significant contributions to the field of engineering, particularly in methods that enhance the structural integrity of canisters used in fuel assembly.

Latest Patents

Donghui Ma holds a patent for a "Residual stress improvement method and residual stress improvement apparatus." This innovative method involves improving residual stress in a canister by filling the space above and around the upper end portion of the canister with fill water. By applying compressive stress to a predetermined region of the canister while shielding it from radioactive rays, this method enhances safety and efficiency in handling fuel assemblies.

Career Highlights

Donghui Ma is currently employed at Kanadevia Corporation, where she continues to develop and refine her innovative techniques. Her work has garnered attention for its practical applications in the nuclear energy sector.

Collaborations

She collaborates with notable colleagues, including Jun Okada and Masanori Goto, who contribute to her research and development efforts.

Conclusion

Donghui Ma's innovative approach to improving residual stress in canisters represents a significant advancement in engineering practices. Her contributions are vital for enhancing safety in the nuclear energy industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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