San Diego, CA, United States of America

Donghoon Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donghoon Lee. Retrieved from https://idiyas.com/inventor/donghoon-lee-6xmtel2g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Donghoon Lee in Antenna Impedance Tuning

Introduction

Donghoon Lee is an accomplished inventor based in San Diego, CA. He has made significant contributions to the field of antenna technology, particularly in the area of impedance tuning. His innovative approach has led to the development of a unique method that enhances the performance of antennas.

Latest Patents

Donghoon Lee holds a patent for "Data-driven methods for look up table-free closed-loop antenna impedance tuning." This patent describes a method and a closed-loop antenna impedance tuning (CL-AIT) system. The system determines an input reflection coefficient and compares it to a threshold value. If the input reflection coefficient exceeds the threshold, an optimal tuner code is determined using a tuner code search algorithm. This optimal tuner code is then applied to configure the CL-AIT system, improving antenna performance.

Career Highlights

Donghoon Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop advanced technologies. His work has been instrumental in enhancing the capabilities of antenna systems, making them more efficient and effective.

Collaborations

He collaborates with talented colleagues, including Pranav Dayal and Kee-Bong Song, who contribute to the innovative projects at Samsung Electronics.

Conclusion

Donghoon Lee's contributions to antenna impedance tuning exemplify the impact of innovative thinking in technology. His patent and ongoing work at Samsung Electronics highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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