Donghoon Han

Title: The Innovative Contributions of Donghoon Han

Introduction

Donghoon Han is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of integrated circuit devices and flow control methods, holding a total of 10 patents. His work reflects a deep understanding of technology and innovation.

Latest Patents

One of his latest patents is an integrated circuit device that includes a substrate with an active region defined by a device isolation layer. This device features a gate trench extending across the active region, a gate dielectric layer conformally covering the inner surface of the gate trench, and a gate electrode filling the trench. The gate electrode is composed of crystal grains of a single metal, with a diagonal length of at least one of the crystal grains being greater than the height of the active region in contact with the gate electrode. Another notable patent is a flow control method using a plasma system. This method involves supplying fluid from a valve to a first sensor, measuring the fluid's temperature, heating it, and determining flow rates based on temperature comparisons. The method also includes controlling fluid supply based on ignition voltage measurements.

Career Highlights

Donghoon Han has worked with leading companies in the technology sector, including Samsung Electronics and SK Telecom. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Some of his notable coworkers include HaYoon Kim and Yunglyul Lee. Their collaboration has likely fostered an environment of creativity and innovation, leading to the development of groundbreaking technologies.

Conclusion

Donghoon Han's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in integrated circuits and flow control methods.