Dongho Heo

Title: Innovations of Dongho Heo

Introduction

Dongho Heo is a prominent inventor based in Fremont, California. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work primarily focuses on methods for etching dielectric layers, which are crucial in the manufacturing of electronic components.

Latest Patents

One of his latest patents is titled "Mask Trimming." This invention provides a method for etching a dielectric layer by forming a patterned mask with isolated and dense areas of mask features. The mask undergoes a trimming process through multiple cycles, which includes depositing a deposition layer and selectively etching both the deposition layer and the patterned mask. This selective etching effectively trims the isolated areas of the mask in relation to the dense areas, allowing for precise etching of the dielectric layer. The mask is then removed after the etching process is complete.

Another notable patent is "Plasma Process with Photoresist Mask Pretreatment." This method involves etching features in a dielectric layer using a photoresist (PR) mask. The PR mask is patterned with laser light of a wavelength not exceeding 193 nm and is pre-treated with noble gas plasma. The process consists of several cycles, each including a deposition phase that deposits a layer over the PR mask and a shaping phase that shapes this deposition layer. This innovative approach enhances the precision of the etching process.

Career Highlights

Dongho Heo is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His expertise in etching techniques has contributed to advancements in semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Jisoo Kim and S M Reza Sadjadi, who share a commitment to innovation in the semiconductor field.

Conclusion

Dongho Heo's contributions to semiconductor technology through his innovative patents demonstrate his significant impact on the industry. His work continues to influence the development of advanced manufacturing techniques.