Donggon Woo

Title: Innovations of Donggon Woo in Semiconductor Technology

Introduction

Donggon Woo is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of critical dimension correction methods. His work is instrumental in enhancing the manufacturing processes of semiconductor devices.

Latest Patents

Donggon Woo holds a patent for a "Full-chip cell critical dimension correction method and method of manufacturing mask using the same." This innovative method involves receiving a database about a full-shot, analyzing its hierarchy, and generating a density map of a full-chip. The process includes converting the density map into a retarget rule table, reconfiguring cell blocks into an optical proximity correction target cell layout, and applying a bias to generate an optical proximity corrected layout for the full-chip.

Career Highlights

Donggon Woo is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His expertise in critical dimension correction has positioned him as a valuable asset to the company. His innovative approaches contribute to the advancement of semiconductor manufacturing technologies.

Collaborations

Donggon Woo has collaborated with notable colleagues, including Dongho Kim and Heejun Lee. Their combined efforts in research and development have led to significant advancements in semiconductor technologies.

Conclusion

Donggon Woo's contributions to semiconductor technology through his innovative patent and collaboration with esteemed colleagues highlight his importance in the field. His work continues to influence the future of semiconductor manufacturing processes.