Gwangju, South Korea

Dong You Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong You Kim. Retrieved from https://idiyas.com/inventor/dong-you-kim-jfukbl6q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Dong You Kim

Dong You Kim is a notable inventor based in Gwangju, South Korea. He has made significant strides in the field of lithography, particularly with his innovative methods for fabricating lithography masks. His work is essential in advancing technologies that rely on precise pattern formation.

Latest Patents

Dong You Kim holds a patent for a "Fabrication method of lithography mask and formation method of fine pattern using the same." This patent outlines a method that includes forming a transparent polymer layer on a substrate with a convex-concave pattern. The process involves separating the polymer layer, depositing a metal thin film, and forming a viscous film on a second substrate. The method ultimately results in a metal thin film pattern that is crucial for various applications in technology.

Career Highlights

Dong You Kim is associated with Samsung Electronics Co., Ltd., a leading company in the electronics industry. His contributions to the field of lithography have positioned him as a key player in the development of advanced manufacturing techniques. His innovative approach has garnered attention and respect within the industry.

Collaborations

Throughout his career, Dong You Kim has collaborated with talented individuals such as Ho Young Song and Won Ho Jung. These collaborations have further enhanced his work and contributed to the success of his projects.

Conclusion

In summary, Dong You Kim's innovative methods in lithography mask fabrication represent a significant advancement in technology. His contributions continue to influence the field and demonstrate the importance of innovation in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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