Singapore, Singapore

Dong Xiang Qi


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Inventor Dong Xiang Qi: Innovating Integrated Circuit Manufacturing

Introduction

Dong Xiang Qi is a notable inventor based in Singapore, known for his significant contribution to the field of integrated circuit manufacturing. With one patent to his name, he has demonstrated expertise in the application of ultraviolet radiation in the manufacturing process. His innovative method holds promise for enhancing the efficiency and effectiveness of integrated circuits.

Latest Patents

Dong Xiang Qi's patent is titled "Method using ultraviolet radiation for integrated circuit manufacturing." This innovative approach involves a method for manufacturing an integrated circuit that includes a substrate along with a gate layer and a gate dielectric. The process entails forming the gate layer into a gate while imposing a charge within the gate dielectric. The substrate, gate, and gate dielectric are then subjected to irradiation to discharge the charge across the gate dielectric, ultimately improving the fabrication process for integrated circuits.

Career Highlights

Dong Xiang Qi is associated with Chartered Semiconductor Manufacturing Ltd, a prominent corporation in the semiconductor industry. His work focuses on advancing technologies that are pivotal for creating smaller and more efficient integrated circuits, reflecting the trends in the electronics market.

Collaborations

Throughout his career, Dong Xiang Qi has collaborated with esteemed colleagues in the field, including Ronald Dickinson and Yeow Meng Teo. These collaborations highlight the value of teamwork and knowledge-sharing in driving technological advancements.

Conclusion

As an inventor, Dong Xiang Qi exemplifies the spirit of innovation by developing methods that push the boundaries of integrated circuit manufacturing. His patent showcases a successful integration of science and engineering, paving the way for future advancements in the semiconductor industry. His ongoing contributions continue to inspire the next generation of inventors and researchers in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…