Seoul, South Korea

Dong Suk Chang

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Suk Chang. Retrieved from https://idiyas.com/inventor/dong-suk-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Dong Suk Chang: Innovator in User Recognition Technology

Introduction

Dong Suk Chang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of user recognition technology. His innovative approach focuses on enhancing user identification systems, particularly in close-range scenarios.

Latest Patents

Dong Suk Chang holds a patent for a "Short distance user recognition system, and method for providing information using same." This patent discloses a system designed to identify users at close range, utilizing network or close-range communication methods. The system allows for the identification of at least one user visible to the client's naked eyes, providing location-based advertisements or information to the identified user.

Career Highlights

Throughout his career, Dong Suk Chang has demonstrated a commitment to advancing technology in user recognition. His work has paved the way for more efficient and effective systems that enhance user experience and interaction.

Collaborations

Dong Suk Chang has collaborated with notable colleagues, including Chul Hyun Kim and Young Bae You. These partnerships have contributed to the development and refinement of his innovative technologies.

Conclusion

Dong Suk Chang is a key figure in the realm of user recognition technology, with a focus on close-range identification systems. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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