This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Innovations of Dong Soon Hwang
Introduction
Dong Soon Hwang is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of substrate treatment and chemical recycling. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate cleaning processes.
Latest Patents
One of Dong Soon Hwang's key patents is a substrate treating apparatus and chemical recycling method. This invention provides a cleaning chamber that effectively removes foreign objects from a substrate. The apparatus includes a recycling unit that recovers a mixed solution containing a first and a second chemical used in the cleaning process. The recycling unit features a separation unit that separates the mixed solution, a recovery line that connects the separation unit to the cleaning chamber, and a decompression line that expels evaporated mixed solution from the separation unit. This innovative design significantly improves the efficiency of substrate treatment.
Career Highlights
Dong Soon Hwang is currently associated with Semes Co., Ltd., where he continues to develop cutting-edge technologies. His work has garnered attention for its potential to revolutionize substrate treatment processes in various industries.
Collaborations
Dong Soon Hwang collaborates with talented individuals such as Jaeryung Ryu and Byung Chul Kang. Their combined expertise contributes to the advancement of innovative solutions in their field.
Conclusion
Dong Soon Hwang's contributions to substrate treatment and chemical recycling exemplify the impact of innovation in technology. His patent reflects a commitment to improving industrial processes, showcasing the importance of inventive thinking in addressing modern challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
