This inventor holds 1 USPTO granted patent. Top assignee: Korea Institute of Energy Research. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Inventor Dong-Seop Jin: Innovating Flue Gas Treatment in Daejeon, KR
Introduction
Dong-Seop Jin is an accomplished inventor based in Daejeon, South Korea, known for his innovative contributions to environmental technology. With a focus on improving air quality, his work centers around efficient processes for treating flue gases, particularly in industrial applications.
Latest Patents
Dong-Seop Jin holds a noteworthy patent titled "Process for removing sulfur dioxide and nitrogen oxides from flue gas using chlorine dioxide." This invention details a method where chlorine dioxide (ClO) reacts with flue gas in an alkaline solution, enabling the simultaneous removal of sulfur dioxide (SO₂) and nitrogen oxides (NOₓ) from industrial emissions. The process not only enhances the removal efficiency but also produces chlorine dioxide through side reactions, which can be reused in the treatment process.
Career Highlights
Currently, Dong-Seop Jin is affiliated with the Korea Institute of Energy Research, where he engages in research aimed at advancing energy technologies. His dedication to innovation in environmental processes places him at the forefront of sustainable engineering practices.
Collaborations
Throughout his career, Dong-Seop Jin has collaborated with esteemed colleagues, including Hyung-Keun Lee and Won-Kil Choi. These partnerships have been instrumental in driving forward their shared goals of developing effective pollution control technologies.
Conclusion
Dong-Seop Jin's innovative approach to flue gas treatment demonstrates the vital importance of addressing environmental challenges through engineering. His patent represents a significant step toward cleaner industrial processes, and his active collaborations continue to contribute to advances in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile