Company Filing History:
Years Active: 2016
Title: The Innovations of Dong-Myung Kim
Introduction
Dong-Myung Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of photoresist compositions, which are essential in the manufacturing of semiconductors and other electronic devices. His innovative work has led to the development of a unique patent that enhances the efficiency and effectiveness of photoresist materials.
Latest Patents
Dong-Myung Kim holds a patent for a photoresist composition that includes an acid-labile polymer, a photoacid generator, an organic base, and a solvent. The composition is designed to improve the performance of photoresists in various applications. Specifically, the photoacid generator is formulated to be about 1 to 30 parts by weight based on 100 parts of the acid-labile polymer, while the organic base is about 0.1 to 5 parts by weight. The solvent constitutes approximately 50 to 90 wt % of the total weight of the composition. This innovative formulation is crucial for advancing the technology in the semiconductor industry.
Career Highlights
Dong-Myung Kim is currently employed at Samsung Display Co., Ltd., where he continues to work on cutting-edge technologies in the field of display and semiconductor materials. His expertise and innovative mindset have positioned him as a valuable asset to the company.
Collaborations
Throughout his career, Dong-Myung Kim has collaborated with talented individuals such as Jun Su Chun and Jeong-Min Park. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Dong-Myung Kim's contributions to the field of photoresist compositions exemplify the importance of innovation in technology. His work at Samsung Display Co., Ltd. and his patent for a novel photoresist composition highlight his role as a leading inventor in the industry.