The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Dec. 17, 2014
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Jun Chun, Yongin-si, KR;
Jeong-Min Park, Seoul, KR;
Sung-Kyun Park, Suwon-si, KR;
Ji-Hyun Kim, Suwon-si, KR;
Jin-Ho Ju, Seoul, KR;
Hyoc-Min Youn, Hwaseong-si, KR;
Dong-Myung Kim, Hwaseong-si, KR;
Jin-Sun Kim, Hwaseong-si, KR;
Tai-Hoon Yeo, Hwaseong-si, KR;
Byung-Uk Kim, Hwaseong-si, KR;
SAMSUNG DISPLAY CO., LTD., Yongin, Gyeonggi-do, KR;
Abstract
A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKvalue of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.