This inventor holds 3 USPTO granted patents and 7 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2023-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023-2025
Title: Innovations of Dong Mok Lee
Introduction
Dong Mok Lee is a prominent inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of plasma processing technology. With a total of 3 patents, his work has advanced the efficiency and effectiveness of substrate processing.
Latest Patents
One of his latest patents is the "Plasma processing apparatus and plasma control method using magnetic field." This invention includes a reaction chamber and a plasma generating device that generates plasma within the chamber. It features a substrate support that holds a wafer for etching and a magnetic module with a permanent magnet and an electromagnet positioned above the reaction chamber. A DC power supply unit is connected to the electromagnet to provide necessary power.
Another notable patent is the "Substrate processing apparatus and method of fabricating same." This invention proposes a substrate processing apparatus with a double-sealing structure. This structure includes a covering member that prevents processing gas from infiltrating the bonding layer and a sealing member that protects the bonding layer from damage. This innovation enhances the durability and operational efficiency of electrostatic chuck devices.
Career Highlights
Dong Mok Lee is currently employed at Semes Co., Ltd., where he continues to develop innovative technologies in plasma processing. His work has been instrumental in improving substrate processing methods, which are crucial in various manufacturing applications.
Collaborations
He has collaborated with notable coworkers, including Jin Il Sung and Sang Kee Lee, contributing to advancements in their respective fields.
Conclusion
Dong Mok Lee's contributions to plasma processing technology through his patents demonstrate his commitment to innovation. His work not only enhances manufacturing processes but also sets a foundation for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
