This inventor holds 1 USPTO granted patent and 11 published patent applications. Top assignees: Sk Ie Technology Co., Ltd., Sk Innovation., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dong Jae Kim: Innovator in Gas Separation Technology
Introduction
Dong Jae Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of gas separation technology. His innovative work has led to the development of a unique composite separator that enhances the efficiency of gas separation processes.
Latest Patents
Dong Jae Kim holds a patent for a composite separator for gas separation. This invention includes a support and a selective layer disposed on one surface of the support. The support is made of a porous polyethylene film, featuring a surface roughness of 100 nm or less, a surface median pore diameter of 300 nm or less, and a tensile strength in both the machine direction (MD) and transverse direction (TD) of 10 MPa or more. This innovative design aims to improve the effectiveness of gas separation.
Career Highlights
Throughout his career, Dong Jae Kim has worked with prominent companies in the technology sector. He has been associated with SK IE Technology Co., Ltd. and SK Innovation, Ltd. His experience in these organizations has contributed to his expertise in developing advanced materials for gas separation.
Collaborations
Dong Jae Kim has collaborated with talented individuals in his field, including Min Sang Park and Sin Woo Kim. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Dong Jae Kim is a distinguished inventor whose work in gas separation technology has made a significant impact. His patent for a composite separator showcases his innovative approach to solving complex engineering challenges. His contributions continue to influence advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile