This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: The Innovations of Dong-hoon Hwang
Introduction
Dong-hoon Hwang is a prominent inventor based in Hwaseong-si, South Korea. He is known for his contributions to the field of integrated circuit devices. His innovative work has led to the development of technologies that enhance the performance and reliability of electronic devices.
Latest Patents
Dong-hoon Hwang holds a patent for "Integrated circuit devices having inter-device isolation regions and methods of manufacturing the same." This patent describes an integrated circuit device that includes a device region and an inter-device isolation region. Within the device region, a fin-type active region protrudes from a substrate, with opposite sidewalls covered by an inner isolation layer. An outer isolation layer fills an outer deep trench in the inter-device isolation region. The design aims to reduce the possibility of defects or failures caused by unnecessary fin-type active regions remaining around the device region. He has 1 patent to his name.
Career Highlights
Dong-hoon Hwang is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at Samsung has positioned him as a key player in the development of advanced electronic components.
Collaborations
Throughout his career, Dong-hoon has collaborated with notable colleagues, including Mirco Cantoro and Tae-yong Kwon. These collaborations have fostered an environment of innovation and creativity, leading to significant advancements in their respective fields.
Conclusion
Dong-hoon Hwang's contributions to integrated circuit technology exemplify the spirit of innovation. His work not only enhances the functionality of electronic devices but also paves the way for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
