This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Innovations of Dong-hoon Chung in Photomask Technology
Introduction
Dong-hoon Chung is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of photomask technology, particularly through his innovative methods for measuring mean-to-target (MTT) based on pattern area measurements. His work is essential for improving the accuracy and efficiency of photomask corrections in semiconductor manufacturing.
Latest Patents
Dong-hoon Chung holds 1 patent for his invention titled "Methods for measuring mean-to-target (MTT) based on pattern area measurements and methods of correcting photomasks using the same." This patent outlines a comprehensive approach to measuring design patterns and correcting photomasks. The method involves providing a design pattern, measuring a plurality of design pattern measurements, and calculating areas based on the shape of the design pattern. The process generates a database that aids in selecting calculation measurements and areas to determine the MTT, ultimately enhancing the precision of photomask corrections.
Career Highlights
Dong-hoon Chung is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in photomask technology. His work at Samsung has positioned him as a key player in advancing semiconductor manufacturing processes. His innovative methods have the potential to significantly impact the efficiency and accuracy of production.
Collaborations
Throughout his career, Dong-hoon Chung has collaborated with talented individuals such as Yo-han Choi and Jong-Won Kim. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor industry.
Conclusion
Dong-hoon Chung's contributions to photomask technology exemplify the importance of innovation in the semiconductor field. His patented methods for measuring MTT and correcting photomasks are vital for enhancing manufacturing precision. His work continues to influence the industry and drive advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile