Hwaseong-si, South Korea

Dong-Hee Yu

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Kyunggi-do, KR (2011)
  • Hwaseong-si, KR (2014)

Company Filing History:


Years Active: 2011-2014

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Innovator in Semiconductor Technology: Dong-Hee Yu

Introduction: Dong-Hee Yu is a notable inventor based in Hwaseong-si, South Korea, recognized for his substantial contributions to the field of semiconductor technology. With a total of two patents to his name, he has demonstrated a significant impact on innovations within integrated circuit devices.

Latest Patents: Dong-Hee Yu's latest patents include groundbreaking developments in semiconductor devices. His first patent outlines a semiconductor device that comprises a substrate, device isolation regions, impurity regions, gate electrodes, and intricate interlayer insulating films. This innovative design enables enhanced electrical connectivity, featuring contact plugs that link metal wiring layers to both impurity regions and gate electrodes.

Furthermore, his second patent details methods for forming field effect transistors, specifically targeting the creation of PMOS transistors with P-type source and drain regions. This patent describes a process that includes forming a diffusion barrier layer and utilizing ultraviolet (UV) radiation to remove hydrogen from deposited silicon nitride layers. This process serves to increase tensile stress in the channel region of the transistors, optimizing their performance.

Career Highlights: Throughout his career, Dong-Hee Yu has worked with leading companies in the technology sector. He has gained valuable experience at Samsung Electronics Co., Ltd. and Infineon Technologies AG, where he has played a vital role in advancing semiconductor innovations.

Collaborations: Dong-Hee Yu has collaborated with talented professionals, including Bong-Seok Suh and O Sung Kwon. These partnerships have contributed to the success and development of cutting-edge technologies in the semiconductor field.

Conclusion: Dong-Hee Yu stands out as an influential inventor in the realm of semiconductor technology. His innovative patents not only advance the industry but also pave the way for future developments in integrated circuits. His contributions exemplify the importance of creativity and collaboration in engineering breakthroughs.

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