Seoul, South Korea

Dong-hee Yeon

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2014.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of Dong-hee Yeon

Introduction

Dong-hee Yeon is a prominent inventor based in Seoul, South Korea. He is known for his contributions to the field of materials science, particularly in the development of metal-doped oxides. His innovative work has led to advancements in solid oxide electrolytes, which are crucial for various applications in energy and electronics.

Latest Patents

Dong-hee Yeon holds a patent for a "Metal-doped oxide, method of preparing the same, and solid oxide electrolyte using the metal-doped oxide." This patent describes a method of preparing a metal-doped oxide, which includes preparing a precursor solution that consists of a zirconium precursor or cerium precursor, a dopant metal precursor, a solvent, and a chloride salt. The process involves heat-treating the precursor solution to create the metal-doped oxide. The resulting oxide includes a metal-doped zirconia or metal-doped ceria, along with chlorine.

Career Highlights

Dong-hee Yeon is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in materials science. His work has significant implications for the development of advanced technologies in the electronics sector.

Collaborations

He has collaborated with notable colleagues, including Soo-yeon Seo and Hee-jung Park, to further enhance the research and development of new materials.

Conclusion

Dong-hee Yeon's contributions to the field of materials science, particularly through his patent on metal-doped oxides, highlight his role as an influential inventor in the industry. His ongoing work at Samsung Electronics Co., Ltd. continues to pave the way for future innovations.

Profile summary based on public USPTO records.
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