Seoul, South Korea

Dong Hae Ho

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Yonsei University. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong Hae Ho. Retrieved from https://idiyas.com/inventor/dong-hae-ho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Dong Hae Ho in 3D Printing Technology

Introduction

Dong Hae Ho is an innovative inventor based in Seoul, South Korea. He has made significant contributions to the field of 3D printing technology. His work focuses on creating safer and more efficient methods for additive manufacturing.

Latest Patents

Dong Hae Ho holds a patent for a "Powdery filament composition for 3D printing, 3D printer and method for manufacturing objects additively by using the same 3D printer." This patent emphasizes a powdery filament composition that is suitable for home use, as it does not produce toxic substances. The 3D printer he developed is designed for home use, requiring low power energy and avoiding high-temperature processing conditions. This innovation aims to make 3D printing more accessible to everyday users.

Career Highlights

Dong Hae Ho is affiliated with Yonsei University, where he continues to advance his research in 3D printing technologies. His work has garnered attention for its practical applications and focus on user safety.

Collaborations

He collaborates with notable colleagues, including Jeong Ho Cho and Soo Young Cho, to further enhance the capabilities and applications of 3D printing technology.

Conclusion

Dong Hae Ho's contributions to 3D printing represent a significant step forward in making this technology safer and more accessible for home users. His innovative approach continues to inspire advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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