This inventor holds 2 USPTO granted patents. Top assignee: Industry-University Cooperation Foundation Hanyang University. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2021
Title: Innovations of Dong Gon Woo
Introduction
Dong Gon Woo is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the development of pellicle structures used in extreme ultraviolet (EUV) lithography. With a total of 2 patents, his work is recognized for its innovative approach to enhancing the efficiency and effectiveness of pellicle systems.
Latest Patents
Dong Gon Woo's latest patents include a pellicle holder, pellicle inspection apparatus, and pellicle inspection method. The pellicle holder features an outer frame with a pellicle seating space and multiple holding legs that can extend or contract to support the pellicle. This design allows for improved handling and inspection of pellicles. His second patent focuses on a method for manufacturing an EUV pellicle structure. This method involves preparing a pellicle membrane with an intermediate layer structure that alternates between EUV transmission layers and heat dissipation layers. Additionally, it includes a cooling structure designed to absorb heat from the pellicle membrane, enhancing its performance.
Career Highlights
Dong Gon Woo is affiliated with the Industry-University Cooperation Foundation at Hanyang University. His role in this institution allows him to bridge the gap between academic research and practical applications in the industry. His innovative work has positioned him as a key figure in the advancement of EUV technology.
Collaborations
Throughout his career, Dong Gon Woo has collaborated with notable colleagues, including Jin Ho Ahn and Young Woong Kim. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further driving innovation in their respective fields.
Conclusion
Dong Gon Woo's contributions to the field of pellicle technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in EUV lithography and provide solutions that enhance the efficiency of manufacturing processes. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile