This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Kolon Industries, Inc.. Active years: 2010-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010-2014
Title: Innovations of Dong-Eun Lee in Cleansing Polyester Fabrics
Introduction
Dong-Eun Lee is a notable inventor based in Gumi-si, South Korea. He has made significant contributions to the field of textile innovation, particularly in the development of cleansing polyester fabrics. With a total of 2 patents, his work focuses on enhancing the performance and usability of fabrics used for cleansing purposes.
Latest Patents
Dong-Eun Lee's latest patents include a groundbreaking invention related to cleansing polyester fabrics. The first patent describes a cleansing polyester fabric that is particularly useful as a makeup cleansing fabric or as a wiping fabric for precision products and optical devices. This fabric exhibits excellent cleansing performance, is soft to the touch, and does not damage the surfaces of the products being cleansed. The second patent outlines a process for preparing this innovative cleansing polyester fabric, which consists of a polyester multifilament and a false twisted mixing yarn. The fabric meets specific criteria, including a warp and weft density sum of 220-320 yarns per inch, a thickness of less than 0.3 mm, and a weight of 70-180 g/m.
Career Highlights
Dong-Eun Lee is currently employed at Kolon Industries, Inc., where he continues to develop innovative textile solutions. His work has positioned him as a key figure in the advancement of cleansing fabrics, contributing to both consumer and industrial applications.
Collaborations
He has collaborated with notable coworkers, including Yang-Soo Park and Heung-Ryul Oh, to further enhance the research and development of textile innovations.
Conclusion
Dong-Eun Lee's contributions to the field of cleansing polyester fabrics demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and practical applications, making a significant impact in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
