Company Filing History:
Years Active: 2016-2017
Title: Innovations of Dong-Eon Lee
Introduction
Dong-Eon Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the area of photo mask manufacturing and patterning methods. With a total of 3 patents to his name, Lee continues to push the boundaries of innovation.
Latest Patents
One of Lee's latest patents is focused on a photo mask and method of manufacturing the same. This photo mask includes a transparent substrate and a mask pattern, which consists of a blocking portion for blocking light and a transmitting portion for transmitting light. The design allows for effective light management, with the blocking portion featuring a first blocking layer, a photo guide layer, and a second blocking layer. The first blocking layer transmits a portion of the light while the photo guide layer directs the transmitted light to the side surface. The second blocking layer reflects the transmitted light, enhancing the overall functionality of the mask.
Another notable patent involves a patterning method using surface plasmon. This method outlines a process for forming a fine pattern by first creating an etching target material layer on a substrate. A first photoresist layer is then applied, followed by a metal pattern that consists of alternating lines and thin film lines. By exciting surface plasmons in the metal pattern through light irradiation, a fine first pattern shape is exposed in the photoresist layer. This innovative approach allows for precise etching of the target material using the first photoresist pattern as a mask.
Career Highlights
Dong-Eon Lee is currently employed at Samsung Display Co., Ltd., where he continues to develop cutting-edge technologies. His work has significantly impacted the display industry, particularly in enhancing the quality and efficiency of display manufacturing processes.
Collaborations
Lee collaborates with talented coworkers, including Jun-Hyuk Woo and Jin-Ho Ju. Together, they contribute to the advancement of innovative technologies within their field.
Conclusion
Dong-Eon Lee's contributions to the field of technology through his patents and work at Samsung Display Co., Ltd. highlight his role as a key innovator. His advancements in photo mask manufacturing and patterning methods demonstrate his commitment to pushing the boundaries of innovation.