Wayne, NJ, United States of America

Donald P Wyman

This inventor holds 4 USPTO granted patents. Top assignee: Gaf Corporation. Active years: 1978-1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donald P Wyman. Retrieved from https://idiyas.com/inventor/donald-p-wyman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 72(Granted Patents)


Company Filing History:


Years Active: 1978-1981

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4 patents (USPTO):Explore Patents

Title: The Innovations of Donald P. Wyman

Introduction

Donald P. Wyman is a notable inventor based in Wayne, NJ, with a significant contribution to the field of radiation curable coatings. He holds a total of four patents, showcasing his expertise and innovative spirit in this specialized area.

Latest Patents

Wyman's latest patents include a radiation curable coating composition comprising an oligomer. Additionally, he has developed a radiation curable coating that is applicable to flexible substrates. His work in this domain highlights the advancements in coating technologies that are both efficient and versatile.

Career Highlights

Wyman is associated with GAF Corporation, a company known for its commitment to innovation in roofing and building materials. His role at GAF Corporation has allowed him to apply his inventive skills to real-world applications, contributing to the company's reputation for quality and innovation.

Collaborations

Throughout his career, Wyman has collaborated with esteemed colleagues such as Donald H. Lorenz and Shu T. Tu. These partnerships have likely enriched his work and led to further advancements in the field of radiation curable coatings.

Conclusion

Donald P. Wyman's contributions to the field of radiation curable coatings exemplify the impact of innovation in material science. His patents and work at GAF Corporation reflect a dedication to advancing technology in practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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