Donald Lie

Title: Innovator Spotlight: Donald Lie - Revolutionizing Micro-Display Technology

Introduction:

Meet Donald Lie, an accomplished inventor based in Lubbock, Texas, who has made significant contributions to the field of micro-display technology. With a patent under his belt and a keen eye for innovation, Donald Lie is reshaping the landscape of active matrix microdisplay systems.

Latest Patents:

Donald Lie's groundbreaking patent is for a CMOS IC for micro-emitter based microdisplay. This cutting-edge technology features an array of micro-emitters and CMOS driving circuits that efficiently control current to each micro-emitter. The driving circuits incorporate MOSFET devices, including PMOSs and NMOSs, to optimize performance and functionality.

Career Highlights:

Donald Lie is a valuable member of Iii-n Technology, Inc., where he channels his passion for innovation into creating next-generation micro-display solutions. His expertise in CMOS technology and micro-emitter arrays has positioned him as a leader in the field, driving advancements that push the boundaries of display technology.

Collaborations:

In his pursuit of excellence, Donald Lie has collaborated with esteemed colleagues, including Jacob Day and Jing Li. Together, they combine their skills and knowledge to explore new possibilities in micro-display technology, fostering a culture of creativity and collaboration at Iii-n Technology, Inc.

Conclusion:

Donald Lie's inventive spirit and dedication to advancing micro-display technology have cemented his reputation as a pioneer in the industry. With a patent that revolutionizes active matrix microdisplay systems, Donald Lie continues to inspire innovation and drive progress in the ever-evolving world of display technology.