San Diego, CA, United States of America

Donald D Lyons

This inventor holds 1 USPTO granted patent. Top assignee: Qualcomm Incorporated. Active years: 2013.


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations by Donald D. Lyons

Introduction

Donald D. Lyons is an accomplished inventor based in San Diego, CA. He is known for his contributions to semiconductor technology, particularly in the area of failure analysis. His innovative work has led to the development of techniques that enhance the reliability and performance of semiconductor devices.

Latest Patents

One of Donald D. Lyons' notable patents is titled "Techniques providing fiducial markers for failure analysis." This patent describes a semiconductor die that includes a group of spacer cells within the semiconductor die. The spacer cells feature fiducial markings that can be located within various layers, including a metal layer, a diffusion layer, a polysilicon layer, and/or a Shallow Trench Isolation (STI) structure. This innovation is crucial for improving the accuracy of failure analysis in semiconductor manufacturing.

Career Highlights

Donald D. Lyons is currently employed at Qualcomm Incorporated, a leading company in the telecommunications and semiconductor industry. His work at Qualcomm has allowed him to contribute significantly to advancements in technology and innovation.

Collaborations

Throughout his career, Donald has collaborated with talented individuals such as Michael Laisne and Xiangdong Pan. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

In summary, Donald D. Lyons is a prominent inventor whose work in semiconductor technology has made a significant impact. His innovative techniques for failure analysis demonstrate his commitment to advancing the field and improving the reliability of semiconductor devices.

Profile summary based on public USPTO records.
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