Berkley, MA, United States of America

Donald C Taber


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Donald C. Taber

Introduction

Donald C. Taber is a notable inventor based in Berkley, MA (US). He has made significant contributions to the field of microelectronics through his innovative patent. His work exemplifies the intersection of technology and creativity, showcasing how inventive minds can solve complex problems.

Latest Patents

Donald C. Taber holds a patent for a "Method of making a package for microelectronic devices using iron oxide as a bonding agent." This patent describes a package for a microelectronic device that includes a thermally conductive base containing a metal composite, which consists of a high conductivity metal and a ferrous alloy. The base features a surface with an iron oxide deposit, and an insulating substrate is placed on this surface. The substrate has an aperture that exposes part of the base for mounting the device. A conductive lead is embedded within the insulating substrate, allowing for electrical connection to the device. The insulating substrate is bonded to the iron oxide deposit through heating, demonstrating a novel approach to microelectronic packaging.

Career Highlights

Donald C. Taber has worked with Stratedge Corporation, where he has applied his expertise in microelectronics. His career is marked by a commitment to innovation and the development of advanced technologies that enhance the performance and reliability of electronic devices.

Collaborations

Throughout his career, Donald has collaborated with notable colleagues, including John R. Robichaud and Raymond Duff. These partnerships have contributed to the advancement of technology in the microelectronics field.

Conclusion

Donald C. Taber's contributions to microelectronics through his innovative patent highlight the importance of creativity in technology. His work continues to influence the industry and inspire future innovations.

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