San Jose, CA, United States of America

Don Schlosser

This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2016.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Don Schlosser: Innovator in EUV Lithography

Introduction

Don Schlosser is a prominent inventor based in San Jose, California. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, which is crucial for advancing semiconductor manufacturing technologies. His innovative work has led to the development of advanced materials that enhance the precision and efficiency of lithographic processes.

Latest Patents

Don Schlosser holds a patent for "PECVD films for EUV lithography." This patent describes multi-layer stacks designed to achieve optimum etch contrast, which is essential for shrinking features and smoothing edges in lithography. The technology enables the use of an optical leveling sensor with minimal error. The multi-layer stacks include an atomically smooth layer with an average local roughness of less than a monolayer, along with one or more underlayers positioned between the target layer and the photoresist. Additionally, the patent outlines methods for depositing these multi-layer stacks, further enhancing their application in EUV lithography.

Career Highlights

Don Schlosser is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His work at Lam Research has positioned him at the forefront of innovation in lithography technologies. With a focus on developing materials that improve the performance of lithographic processes, Schlosser has established himself as a key figure in the industry.

Collaborations

Throughout his career, Don has collaborated with notable colleagues, including Nader Shamma and Thomas W Mountsier. These collaborations have fostered an environment of innovation and have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Don Schlosser's contributions to EUV lithography exemplify the impact of innovative thinking in the semiconductor industry. His patent for PECVD films showcases his commitment to enhancing lithographic processes, making him a valuable asset to Lam Research Corporation and the broader field of semiconductor technology.

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