This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1994.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1994
Title: Don F Haire: Innovator in Electron Beam Technology
Introduction
Don F Haire is a notable inventor based in Verbank, NY (US). He has made significant contributions to the field of electron beam technology, particularly in the area of dynamic compensation for non-linear electron beam landing angles. His innovative work has implications for high-accuracy telecentric deflection systems.
Latest Patents
Haire holds 1 patent for his invention titled "Dynamic compensation of non-linear electron beam landing angle." This patent describes a dynamic correction arrangement for an electron beam projection and deflection system. The system provides high-order correction values for deflection in accordance with a correction equation. The coefficients of the correction equation can be determined through calibration at a small number of test points. Correction values may be stored in a look-up table or computed in real-time using a math co-processor in a processing pipeline. This correction effectively addresses landing angle errors through the third order in telecentric projection and deflection systems, including those utilizing variable axis immersion lenses.
Career Highlights
Don F Haire has had a distinguished career at International Business Machines Corporation (IBM). His work has focused on advancing technologies that enhance the precision and efficiency of electron beam systems. His innovative contributions have positioned him as a key figure in the field.
Collaborations
Throughout his career, Haire has collaborated with esteemed colleagues such as Cecil T Ho and Guenther O Langner. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in electron beam applications.
Conclusion
Don F Haire's contributions to electron beam technology exemplify the spirit of innovation. His patent on dynamic compensation for non-linear electron beam landing angles showcases his expertise and commitment to advancing the field. His work continues to influence the development of high-accuracy deflection systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile