Domokos Hadnagy

Title: Domokos Hadnagy: Innovator in Ferroelectric Capacitors

Introduction

Domokos Hadnagy is a notable inventor based in Colorado Springs, CO (US). He has made significant contributions to the field of ferroelectric materials, particularly in the development of advanced capacitors. With a total of 2 patents, his work focuses on improving data retention performance in ferroelectric capacitors.

Latest Patents

Hadnagy's latest patents involve the use of calcium and strontium dopants to enhance the retention performance of lead zirconate titanate ferroelectric films. These films serve as the dielectric layer in ferroelectric capacitors. The chemical formula for the ferroelectric film is: (Pb.sub.v Ca.sub.w Sr.sub.x La.sub.y)(Zr.sub.z Ti.sub.(1-z))O.sub.3, where specific values for v, w, x, y, and z are defined to optimize performance. The patents also detail the method for creating these films, which includes sputtering onto a bottom electrode from a target comprising lead zirconate titanate doped with calcium, strontium, and lanthanum.

Career Highlights

Domokos Hadnagy is currently employed at Ramtron International Corporation, where he continues to innovate in the field of ferroelectric materials. His work has been instrumental in advancing the technology used in memory cells, particularly those that integrate ferroelectric capacitors with MOS transistors.

Collaborations

Some of Hadnagy's notable coworkers include Lee Kammerdiner and Tom Davenport. Their collaborative efforts contribute to the ongoing research and development in the field of ferroelectric materials.

Conclusion

Domokos Hadnagy's contributions to the field of ferroelectric capacitors highlight his innovative spirit and dedication to advancing technology. His patents and work at Ramtron International Corporation continue to influence the development of memory technologies.