Dominique L Nguyen-Ngoc

Title: **Innovations by Dominique L Nguyen-Ngoc: A Journey of Patents and Collaborations**

Introduction

Dominique L Nguyen-Ngoc is an accomplished inventor based in Peekskill, NY. With a total of four patents to her name, she has made significant contributions to the fields of lithography and semiconductor technology. Her innovative approaches reflect her dedication to advancing the technological landscape.

Latest Patents

Among her latest achievements, Dominique developed a **Method of Simultaneous Lithography and Etch Correction Flow**. This innovative method allows for the optimization of mask corrections by analyzing two independent process models concurrently. By running simulations for both lithography and etch processes in a unified iterative loop, Dominique successfully centers the sizes of the masks within a common process window, enhancing the efficiency of semiconductor manufacturing.

Another notable patent is her **Microwave Array Transistor for Low-Noise and High-Power Applications**. This transistor array technology includes a finely designed layout with multiple transistors sharing base contacts and collector reach-throughs, making it ideal for high-performance applications. Her work in creating efficient transistor structures exemplifies her expertise in both design and materials.

Career Highlights

Dominique’s career spans impressive stints at major technology players such as **IBM** and **GlobalFoundries Inc.**. These experiences have not only honed her technical skills but also provided her with opportunities to apply her inventive ideas in real-world settings, leading to the patent innovations she is known for today.

Collaborations

Throughout her career, Dominique has collaborated with talented colleagues, including Robert Allen Groves and Dale K Jadus. These partnerships illustrate the collaborative spirit that often drives innovation in the tech industry, as diverse skills and viewpoints converge to produce groundbreaking results.

Conclusion

Dominique L Nguyen-Ngoc stands out as a prominent figure in innovation, driven by her commitment to pushing the boundaries of technology. Her patents and collaborations highlight her influential role in shaping advancements in lithography and semiconductor applications. As the industry continues to evolve, her contributions remain a testament to the impact that inventors like her can have on the future of technology.