Altendorf, Germany

Dominik Oeh

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Siemens Aktiengesellschaft. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dominik Oeh. Retrieved from https://idiyas.com/inventor/dominik-oeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Dominik Oeh and Reference Model-Based System Development.

Introduction

Dominik Oeh is an inventor associated with Altendorf, Germany. His patent work concerns methods for developing technical systems and their components using reference models and digital twins.

Latest Patents

Oeh is named on one patent: “Method, Computer Program Product and Modeling Tool for the Reference Model-Based, Component-Related Development of a Technical System.” The invention describes a computer-based process for identifying a suitable reference-model component and preparing it for reuse in system development. It organizes this process into three orchestration phases: locating the component in a digital twin, identifying and assessing the relevant sub-model content, and reducing that content to generate the reusable component. Oeh is associated with 1 patent.

Career Highlights

Oeh’s listed patent is assigned to Siemens Aktiengesellschaft, commonly known as Siemens AG. The invention addresses automation and reuse in the development of technical systems, with digital twins serving as a source for relevant model components.

Collaborations

Nikolaus Regnat and Sieglinde Kranz are identified as Oeh’s coworkers. The available information does not specify their roles in the patent or their contributions to the invention.

Conclusion

Dominik Oeh’s patent work focuses on streamlining component development through reference models, digital twins, and automated model reduction.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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