Reutlingen, Germany

Dominik Neeser

This inventor holds 1 USPTO granted patent and 4 published patent applications and 1 EPO patent. Top assignee: Robert Bosch. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dominik Neeser. Retrieved from https://idiyas.com/inventor/dominik-neeser

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Dominik Neeser: Innovator in Drill Orientation Technology

Introduction

Dominik Neeser is a notable inventor based in Reutlingen, Germany. He has made significant contributions to the field of drilling technology, particularly with his innovative methods and devices.

Latest Patents

Neeser holds a patent for a "Method and device for ascertaining the orientation of a drill relative to a plane." This device is designed to be connected to a drill and features a laser distance measuring unit. It measures distances to two points on a plane from a specified position, allowing for the accurate determination of the drill's orientation relative to that plane. This invention enhances precision in drilling operations.

Career Highlights

Throughout his career, Neeser has worked with prominent companies, including Robert Bosch GmbH and Automotive Lighting Reutlingen GmbH. His experience in these organizations has contributed to his expertise in engineering and innovation.

Collaborations

Neeser has collaborated with talented individuals such as Balazs Jatekos and Benno Roesener. These partnerships have likely enriched his work and led to further advancements in his projects.

Conclusion

Dominik Neeser is a distinguished inventor whose work in drill orientation technology exemplifies innovation in engineering. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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