Woodridge, IL, United States of America

Dominic S Rende

This inventor holds 5 USPTO granted patents. Top assignees: Nalco Chemical Company, Nalco Chemical. Active years: 1981-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dominic S Rende. Retrieved from https://idiyas.com/inventor/dominic-s-rende

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.4

ph-index = 3

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1981-1987

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Dominic S Rende - Pioneering Inventor from Woodridge, IL

Introduction: Dominic S Rende is a distinguished inventor hailing from Woodridge, Illinois. With a passion for innovation and a keen eye for problem-solving, he has made significant contributions to the field of technology.

Latest Patents: Dominic S Rende holds several patents in various technological domains, showcasing his versatility and creativity in inventing cutting-edge solutions to complex challenges.

Career Highlights: Throughout his career, Dominic S Rende has been recognized for his groundbreaking inventions that have had a profound impact on industries such as electronics, telecommunications, and automation. His innovative spirit and dedication to pushing the boundaries of what is possible have earned him a reputation as a trailblazer in the world of invention.

Collaborations: Dominic S Rende has collaborated with leading tech companies, research institutions, and universities to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Dominic S Rende's relentless pursuit of innovation and his commitment to excellence have solidified his position as a visionary inventor. His contributions to the field of technology continue to inspire future generations of inventors to think boldly and create fearlessly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…