Livermore, CA, United States of America

Dominic Frank Truchetta

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Global Storage Technologies Netherlands B.v.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dominic Frank Truchetta. Retrieved from https://idiyas.com/inventor/dominic-frank-truchetta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: **Dominic Frank Truchetta: Innovator in Plasma Processing Technology**

Introduction

Dominic Frank Truchetta, based in Livermore, California, is a notable inventor recognized for his significant contributions to plasma processing technology. With a single patent to his name, Truchetta has tackled the complex challenge of electrostatic wafer sticking, an issue prevalent in plasma deposition and etch tools.

Latest Patents

Truchetta's patent, titled "Prevention of Electrostatic Wafer Sticking in Plasma Deposition/Ethc Tools," addresses the unwanted electrostatic charge that builds up on substrates or substrate clamping mechanisms in a plasma processing chamber. His innovative process alters the standard RF power supply shutdown procedure. By implementing a stepped RF power shutdown sequence, where the RF power is reduced from full power to approximately 5 to 10 watts temporarily, Truchetta’s method allows the plasma to neutralize the electrostatic charge effectively. This invention offers a valuable solution to preventing wafer sticking problems during plasma processing.

Career Highlights

Dominic Frank Truchetta is associated with Hitachi Global Storage Technologies, where he applies his expertise in the semiconductor industry. His work has been instrumental in enhancing plasma processing methods, contributing to the efficiency and reliability of the manufacturing processes within the company.

Collaborations

Throughout his career, Truchetta has worked alongside esteemed colleagues, including Donald Giles Allen and Richard Jule Contreras. Their collective efforts contribute to advancements in technologies relevant to the semiconductor field and bolster the innovation landscape at Hitachi Global Storage Technologies.

Conclusion

Dominic Frank Truchetta exemplifies the spirit of innovation in the realm of plasma processing technologies. His patent addressing electrostatic wafer sticking stands as a testament to his ingenuity and dedication to solving complex engineering challenges. As the semiconductor industry continues to evolve, inventors like Truchetta play a critical role in driving advancements that support improved manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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