Dohyun Go

Title: The Innovations of Dohyun Go

Introduction

Dohyun Go is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Dohyun Go's latest patents include innovative designs for semiconductor devices. One of his patents describes a semiconductor device that incorporates reflow layers. This device features a substrate with an active pattern and a channel pattern that consists of multiple vertically stacked semiconductor patterns. The design includes a source/drain pattern connected to these semiconductor patterns and a gate electrode that is interposed between them. Notably, the buffer layer in the source/drain pattern contains silicon germanium (SiGe), with a specific germanium concentration that varies between the reflow layer and the semiconductor layer.

Another significant patent focuses on multi-channel field effect transistors with enhanced multi-layered source/drain regions. This invention includes a semiconductor active region with a vertical stack of multiple spaced-apart semiconductor channel regions. The source/drain region is designed with a stack of epitaxial layers that have different electrical characteristics, optimizing the performance of the semiconductor device.

Career Highlights

Dohyun Go is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to advancements that have a wide-ranging impact on the industry.

Collaborations

Throughout his career, Dohyun Go has collaborated with notable colleagues, including Sanggil Lee and Jungtaek Kim. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Dohyun Go's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a deep understanding of complex semiconductor systems and a commitment to advancing the field. His work continues to influence the future of technology and semiconductor design.