Taejon, South Korea

DoHoon Lee

This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: DoHoon Lee. Retrieved from https://idiyas.com/inventor/dohoon-lee-d0trlv4x

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 106(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by DoHoon Lee

DoHoon Lee is a notable inventor based in Taejon, South Korea. He has made significant contributions to the field of cybersecurity through his innovative patent.

Latest Patents

One of his most recent patents is titled "System and method of detecting anomaly malicious code by using process behavior prediction technique." This invention provides a pattern analyzing and detecting method that is capable of identifying and effectively preventing unknown malicious code attacks. The method involves monitoring the system to combine all behaviors exhibited due to corresponding malicious codes. It reprocesses and learns these behaviors, analyzes existing malicious behavior feature values, and compares them with behavior patterns exhibited by execution codes.

Career Highlights

DoHoon Lee is affiliated with the Electronics and Telecommunications Research Institute, where he continues to work on advancing technology in his field. His dedication to innovation has positioned him as a key figure in the research community.

Collaborations

He has collaborated with notable colleagues such as HyungGeun Oh and Seung-Hyun Paek, contributing to various projects that enhance the understanding and prevention of cybersecurity threats.

Conclusion

DoHoon Lee's work exemplifies the importance of innovation in combating cybersecurity challenges. His contributions through patents and collaborations continue to shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…